【作者】 李思杰； 马俊平； 平杰红； 唐显； 孙玉华；

【Author】 LI Si-jie;MA Jun-ping;PING Jie-hong;TANG Xian;SUN Yu-hua;China Institute of Atomic Energy;

【机构】 中国原子能科学研究院；

【摘要】 涂覆工艺是制备平面放射性光源的关键技术之一,目的是为平面放射性光源提供高质量的荧光涂层,提高对放射性物质的利用率。采用沉积法制备荧光层,并对荧光层的影响因素进行了研究和优化,最后充入放射性物质,得到在β粒子激发下的光输出特性。实验结果表明,采用沉积法制备的荧光涂层具有较好的均匀性与牢固性;荧光粉和水的含量是影响涂层厚度的首要因素,玻璃粉的含量在10%～15%为宜;当荧光涂层质量厚度范围为7～9 mg/cm~2时,发光亮度较佳,在0.70 atm氚气压力下,发光亮度最高达到0.92 cd/m~2。更多还原

【Abstract】 Coating process is one of the key technologies for preparing planar radioactive light source(RLS).In order to improve the utilization rate of radioactive gas by planar RLS,the preparation of its phosphor layer and its luminescent properties are studied to provide high-quality phosphor coating for planar RLS.First,the phosphor layer was prepared by deposition method,and the influencing factors were studied and optimized.Finally,the light output characteristics under the excitation of β particles were obtained by charging the radioactive gases.Experimental results indicate that,the phosphor coating prepared by the deposition method had better uniformity and firmness;the phosphor and water content were the primary factors affecting the thickness of the coating,and the content of the glass powder was between 10% and 15 %.When the thickness was7～9 mg/cm~2,the brightness was higher than other thicknesses.Under the pressure of 0.70 atm radioactive gas,the luminescence brightness was up to 0.92 cd/m~2.更多还原