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激光钕玻璃连续熔炼技术
Continuous melting technology of neodymium laser glass
【作者】 唐景平; 王标; 陈树彬; 翁泽安; 陈尤阔; 金春荣; 陈伟; 温磊; 胡俊江; 徐永春; 程继萌; 李顺光; 邹兆松; 胡丽丽;
【Author】 Tang Jing-ping;Wang Biao;Chen Shu-bin;Weng ze-an;Chen You-kuo;Jin Chun-rong;Chen Wei;Wen Lei;Hu Jun-jiang;Xu yong-chun;Chen Ji-meng;Li Shun-guang;Zou Zhao-song;Hu Li-li;Shanghai Institute of Optics & Fine Mechanics,Chinese Academy of Science;
【机构】 中国科学院上海光学精密机械研究所;
【摘要】 为满足神光装置发展和未来国家专项工程对激光玻璃工作物质的大量需求,上海光机所研究开发了激光钕玻璃连续熔炼技术。激光玻璃连续熔炼是一种全新的工艺技术,我们通过10年工作先后攻克了除羟基、除铂颗粒、过渡金属杂质离子控制、大尺寸成型和低应力隧道窑退火等一系列关键单元技术,成功实现了N31钕玻璃的连续熔炼批量制造。连续熔炼N31激光钕玻璃的荧光寿命、激光波长吸收损耗、光学均匀性等指标达到神光装置的使用要求,并与坩埚熔炼的激光玻璃性质进行了比较。连续熔炼钕玻璃的参数一致性和400nm吸收系数指标优于坩埚熔炼钕玻璃。此外,与美国LLNL报道的连熔LHG-8钕玻璃相比,连熔N3135钕玻璃的3333nm吸收系数和铂颗粒破坏阈值均优于LHG-8钕玻璃。
【Abstract】 In order to meet the demand of large scale high power laser system for Initial Confinement Fusion on thousand picccs of large size laser glasses,Shanghai Institute of Optics and Fine Mechanics,China has developed the continuous melting technology of N31 neodymium phosphate laser glass since 2005.A series of key technologies of continuous melting such as dehydroxylation,Pt-inclusion removal,and transition metal impurities control,large size casting and crack and birefringence control in lehr annealing have been solved.The key technologies were integrated,mass production of N31 laser glasses had been realized.The fluorescent lifetime,attenuation at 1053 nm,optical homogeneity and other properties of the continuous melted laser glasses were compared with those of pot melted glasses.N31 glass has lower absorption coefficient at3333 nm and larger laser damage threshold caused by platinum inclusion than those of LHG-8 glass which was used in NIF facility in US.It indicates that both dehydroxylation and platinum inclusion removal techniques are successfully applied in continuous melting processing of N31 laser glass.
【Key words】 Neodymium phosphate laser glass; Continuous melting; Dehydroxylation; Pt-inclusions removal;
- 【会议录名称】 强激光材料与元器件学术研讨会暨激光破坏学术研讨会论文集
- 【会议名称】强激光材料与元器件学术研讨会暨激光破坏学术研讨会
- 【会议时间】2016-11-13
- 【会议地点】中国四川成都
- 【分类号】TQ171.735
- 【主办单位】中国工程院信息与电子工程学部、国家自然科学基金委员会、中国光学工程学会