【作者】 金会良； 邓文辉； 唐才学； 陈贤华；

【Author】 Jin Huiliang;Deng Wenhui;Tang Caixue;Chen Xianhua;Chengdu Fine Optical Engineering Research Center;

【机构】 成都精密光学工程研究中心；

【摘要】 在大气等离子体加工去除的化学反应过程中,反应气体的激发和电离是等离子体发生化学反应的关键步骤之一。通过原子发射光谱测量技术对反应气体CF₄激发的光谱进行分析,研究大气等离子体加工参数对反应活性F原子和CF₂自由基光谱特性的作用规律,进而间接建立起大气等离子体加工参数对加工过程中刻蚀去除和表面沉积的影响。实验结果表明:活性F原子光谱强度随射频输入功率的增大而增强,而电离产生的CF₂自由基光谱强度随射频输入功率的增大逐渐减小;随着CF₄流量的增加,F原子和CF₂自由基的光谱变化都呈现先增加后减小的趋势,并且F原子光谱强度要远大于CF₂自由基的光谱强度;在CF₄等离子体中加入辅助气体0₂后,由于0₂易和CF₄解离的中间产物反应,抑制活性粒子重新组合,活性氟原子的密度逐渐增加,并且当0₂含量约为20%时,活性F原子密度达到最大值。更多还原

【Abstract】 The surface chemistry reaction involved in the processing of Atmospheric Pressure Plasma Jet（APPJ）produced from CF₄ precursor has been explored.The atomic emission spectroscopy of F atoms and CF₂ molecules was investigated as they contribute to substrate etching and FC film formation during APPJ processing.Optical emission spectroscopy（OES） spectra were acquired for CF₄ plasma,relative concentrations of excited state species of F atoms and CF₂ molecules were also dependent upon plasma parameters.The densities of F atoms increased dramatically with increasing applied RF power,whereas CF₂ molecules decreased monotonically over the same power range,the subsequent electron impacted decomposition of plasma species after CF₄ precursor fragmentation.The spectrum of the F atoms and CF₂molecules fallowed the same tendency with the increasing concentration of gas CF₄,reaching the maximum at the 20 sccm and 15 seem respectively,and then the emission intensity of reactive atoms decreased with more CF₄ molecules participating.Addition certain amount O₂ into CF₄ plasma resulted in promoting CF₄ dissociation,O₂ can easily react with the dissociation product of CF₂ molecules,which inhibit the compound of the F atoms,so with the increasing concentration of O₂,the concentration of the CF₂ molecules decreased and the emission intensities of F atoms showed the maximum at the O₂/CF₄ratio of 20%.These results have led to the development of a scheme that illustrates the mechanisms of surface chemistry reaction and the affection of plasma parameters in CF₄ plasma systems with respect to F and CF₂ gas-phase species.更多还原