【作者】 袁志刚； 李亚国； 陈贤华； 叶卉； 徐曦； 赵世杰； 周炼； 王健；

【Author】 Yuan Zhigang;Li Yaguo;Chen Xianhua;Ye Hui;Xu Xi;Zhao Shijie;Zhou Lian;Wang Jian;Fine Optical Engineering Research Center;

【机构】 成都精密光学工程研究中心；

【摘要】 熔石英光学元件因为其良好的光学性能和机械性能在高功率激光系统中得到了广泛的应用。然而,在355nm激光作用于光学元件后,熔石英的损伤阈值及损伤增长问题变成了其在强激光系统中发展的瓶颈。为了提高激光诱导损伤阈值（LIDT）,熔石英光学元件使用两种HF溶液进行处理,分别是1.7%的HF溶液和0.4%的HF与12%的NH₄F的BOE溶液。损伤测试表明,这两种刻蚀液在去除材料一定深度的情况下都会提高损伤阈值,但是进一步去除就会大大降低元件的激光损伤能力。在处理过程中,这两种刻蚀液的去除速率都很稳定,分别为85.9μφ、min和58.6μm.min左右。另外,元件表面的粗糙度（RMS&PV）会随着刻蚀时间的增加而变大。同时,在刻蚀过程中通过纳米技术测得的熔石英元件表面的硬度及杨氏系数,没有证据表明其与激光诱导损伤有明确的关系。更多还原

【Abstract】 Fused silica is widely used in high-power laser systems because of its good optical performance and mechanical properties.However,laser damage initiation and growth induced by 355 nm laser illumination in optical elements have become a bottleneck in the development of high energy laser system.In order to improve the laser-induced damage threshold(LIDT),the fused silica optics were treated by two types of HF-based etchants:1.7%wt.HF acid and buffer oxide etchant(BOE:the mixture of0.4%wt.HF and 12%wt.NH4F),respectively,for varied etching time.Damage testing shows that both the etchants increase the damage threshold at a certain depth of material removal,but further removal of material lowers the LIDT markedly.The etching rates of both etchants keep steady in our processing procedure,~85.9μg/min and ~58.6 μg/min,respectively.The micro-surface roughness(RMS&PV)increases as etching time extends.The hardness(H) and Young’s modulus(E) of the fused silica etched for diverse time,measured by nano-indenter,show no solid evidence that LIDT can be related to hardness or Young’s modulus.更多还原