【作者】 李海涛； 荣守范； 朱永长； 孙建波； 王涛； 杨文杰； 王强；

【Author】 LI Hai-tao;RONG Shou-fan;ZHU Yong-chang;SUN Jian-bo;WANG Tao;YANG Wen-jie;WANG Qiang;Ministry of Education Research Center of Metal Wear Resistance and Surface Technology Engineering,Jiamusi University;School of Material Science and Engineering, Jilin University;

【机构】 佳木斯大学教育部金属耐磨材料与表面技术工程研究中心； 吉林大学材料科学与工程学院；

【摘要】 采用磁控溅射法,分别在AZ31和Mg-8Li镁合金基片上制备了Ti Si/Ti Si N/Ti Si/Ti Si N薄膜。借助X射线荧光光谱(XRF)、扫描电镜(SEM)、X射线小角掠入射(GIXRD)以及涂层附着力自动划痕仪对膜层表面元素含量、膜层结构和晶粒尺寸、表面形貌和膜基结合力进行了分析。结果表明:膜层表面Ti、Si元素比值接近靶材中的Ti、Si原子比,且各元素分布相对均匀,只是在基片边缘处有元素分布过高或过低的现象;膜层衍射峰由基体和Ti N构成,晶粒尺寸分别为27.978nm(AZ31)和31.433nm(Mg-8Li);薄膜完整连续,厚度均匀,部分膜层出现弥散分布的白色颗粒;薄膜与基体结合良好,膜基结合力临界载荷分别为7.32N(AZ31)和9.94N(Mg-8Li)。更多还原

【Abstract】 Ti Si/Ti Si N/Ti Si/Ti Si N films were prepared on magnesium alloy substrate by magnetron sputtering process. Chemical composition, surface morphology, adhesion strength and crystalline structure were investigated by X-fluorescence(XRF), scanning electron microscopy(SEM), scratch instrument and based on the grazing incidence X-ray diffraction(GIXRD) methods, respectively. Results show that the Ti-Si of target were better deposited on substrate and distributed uniformly in center of film, the content of film is close to target material. Crystal structure is composed of substrate and TiN, the size of grain are 27.978 nm deposited on AZ31 and 31.433 nm deposited on Mg-8Li. Surface morphology exhibits the films are integrate, consecutive and compact, the film deposited on AZ31 appears the white particles. The adhesion critical loads of film are 7.32 N(AZ31) and 9.94 N(Mg-8Li) respectively.更多还原