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Si基GaN的微结构表征(英文)

Characterization for microstructure of GaN on Si substrates

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【作者】 江若琏陈鹏赵作明沈波郑有斗

【Author】 JIANG Ruo-lian;CHEN Pen;ZHAO Zuo-ming;SHEN Bo;ZHENG You-dou;Department of Physics,Nanjing University;

【机构】 南京大学物理系

【摘要】 <正>GaN-based materials have attracted great interest because of its direct and wide band gap,high-saturation electron drift velocity and the excellent physical and chemical properties.In the recent years,the growth technology of GaN on sapphire has been relatively mature.GaN films grown on Si substrates are more attractive for their low cost,large size and the possibility of integrating GaN and Si devices.However

【基金】 supported by the National Science Foundation of China Nos.60276031,60136020
  • 【会议录名称】 第十二届全国光散射学术会议论文摘要集
  • 【会议名称】第十二届全国光散射学术会议
  • 【会议时间】2003-10-26
  • 【会议地点】中国辽宁大连
  • 【分类号】O614.371
  • 【主办单位】中国物理学会光散射专业委员会
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