【作者】 叶笛； 肖宇； 刁训刚； 孙志嘉； 周健荣； 王艳凤； 杨桂安； 许虹； 陈元柏；

【Author】 YE Di;XIAO Yu;DIAO Xun-gang;SUN Zhi-jia;ZHOU Jian-rong;WANG Yan-feng;YANG Gui-an;XU Hong;CHEN Yuan-bai;Institute of High Energy Physics Chinese Academy of Sciences;Beihang University;

【机构】 中国科学院高能物理研究所； 北京航空航天大学；

【摘要】 GEM是近年来蓬勃发展起来且技术日趋成熟的新型气体探测器,性能十分突出,有很好的位置分辨,高计数率,耐辐射,信号读出方式简单、灵活,能制作大面积探测器,应用范围广。涂硼GEM中子探测器是由多层级联涂硼GEM膜作为中子转换载体,通过一级GEM进行气体放大,由读出电极将中子击中信息读出。该探测器,性能优越,满足新一代中子探测器发展的技术要求。涂硼GEM中子探测器的核心部件是涂硼中子转换电极,包括涂硼阴极和涂硼GEM膜,由于硼是非金属介质,熔点还很高(>2 000℃),不能采用电镀,也不能使用热蒸发,因此如何在电极上镀上符合中子探测要求的、高质量的硼层用于制作中子转换电极,成为了涂硼GEM中子探测器发展过程中的关键技术。相比于蒸发法,溅射法有沉积温度较低,成膜纯度高,结合力好的特点,比较适合本课题的研究。磁控溅射是对溅射法的一种改进方法,较普通的溅射法可以在较低的工作气压、较高的靶电压下进行溅射,膜的性能可以得到进一步的提升。本文通过对镀膜工艺的摸索,采用磁控溅射方法在铜电极和GEM膜上制备纯硼薄膜,具有成膜质量高、成膜速度快、膜层与基底附着力强不易脱落、引入杂质少、膜层厚度均匀可控和成本低等特点。更多还原

【Abstract】 GEM is a flourishing new gas detector and nowadays its technology become more mature.It has outstanding properties,such as excellent position resolution,high counting rate,radiation resistance,simple and flexible signal readout,can be large-area detector,wide application range.Detector with boron deposited GEM uses multilayer GEM with deposited boron film as neutron conversion carrier which reads out the information of neutron shot from the readout electrode with gas amplification from every GEM layer.The detector is high performance which can meet the demands of neutron detector of a new generation.Boron deposited neutron conversion electrode with boron deposited cathode and GEM included is the core part of the detector.As boron is a high-melting-point metalloid(>2000℃),electroplating and thermal evaporation are inappropriate ways.So finding a way to deposit boron on electrode which can meet the demands become a key technology in the development of neutron detector with boron deposited GEM.Compared with evaporation,sputtering has features such as low deposition temperature,high film purity,nice adhesive,thus is appropriate for our research.Magnetron sputtering is a improved way of sputtering which can get lower sputtering air pressure and higher target voltage,so that we can get better films.Through deposit process,the research uses magnetron sputtering to deposit pure boron film on copper electrode and GEM film.This method can get high quality,nice adhere,high purity,controllable uniformity,low cost film with high speed film formation.更多还原