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非平衡磁控溅射制备Ti-N-C薄膜性能研究(英文)

Properties of Ti-N-C Films Prepared by Unbalanced Magnetron Sputtering

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【作者】 张以忱吴宇峰巴德纯

【Author】 Zhang Yichen Wu Yufeng Ba Dechun (College of Mechanical Engineering and Automation, Northeastern University, Shenyang 110004)

【机构】 东北大学机械工程与自动化学院

【摘要】 采用霍尔离子源辅助中频非平衡磁控溅射技术,通过改变工作气氛,偏压模式,溅射电流以及辅助离子束电流,在不锈钢、高速钢等不同材料的基体上制备了Ti/TiN、Ti/TiN/Ti(C,N) 膜系的硬质抗磨损膜层。利用分光分度计、扫描电子显微镜、X射线衍射仪、轮廓仪和纳米力学综合测试仪等分析仪器对膜的颜色、晶体结构以及膜层结合力等性能进行检测分析。实验及分析结果表明:膜层的颜色对工作气氛非常敏感,反应溅射中工作气氛的微小变化会引起表面膜层颜色相当大的变化。非平衡磁控溅射技术和其他的PVD技术制备Ti(C,N)相比,晶体择优取向并没有明显的变化,因此它们具有相近似的性质。膜层的膜基结合力及膜层的表面改性作用受基体材料影响都较大。在镀膜过程中施加霍尔电流,可以有效地增加膜基结合力。

【Abstract】 A series of Ti/TiN and Ti/TiN/Ti(C, N) hard anti-wear films was grown by a newly developed technique called unbalanced magnetron sputtering (UBMS), a technique combining conventional magnetron sputtering and ion assisted deposition. series of films are deposited on different materials like stainless and high speed steels by changing atmosphere, bias mode, sputtering and ion beam assisted currents. The color, crystal structure and binding force of film are tested and analyzed, respectively. Experimental results show that color of film is sensitive to atmosphere, slight change of atmosphere can influence the coating’s color seriously. The preferred orientation of Ti(C,N) films prepared by MF twin targets unbalanced magnetron sputtering has no obvious change compared with the film deposited by other PVD technologies. The substrate material has great influence on film’s binding energy and surface modification. The application of Hall current can effectively improve the binding force between film and substrate.

  • 【会议录名称】 真空冶金与表面工程——第八届真空冶金与表面工程学术会议论文集
  • 【会议名称】第八届真空冶金与表面工程学术会议
  • 【会议时间】2007-06
  • 【会议地点】中国辽宁沈阳
  • 【分类号】TB383.2
  • 【主办单位】中国真空学会真空冶金专业委员会
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