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电磁屏蔽层设计及其磁控溅射制备的研究
Growth of Electromagnetic Shielding Multilayer by Magnetron Sputtering for Plastic Chassis
【Author】 Wang Demiao,Dong Shurong and Ren Caochao Department of Info. Sci. & Elec. Eng. ,Zhejiang University, Hangzhou ,310021, China
【机构】 浙江大学信电系;
【摘要】 通过传输线模型推导出多层无限大平板的屏蔽效能的计算公式,并根据公式设计了双层屏蔽层,通过多靶直流溅射制备了多种金属屏蔽膜。研究结果表明:衰减损耗是各层屏蔽效果线性相加的结果,反射损耗与各层相对位置关系无关, 层数多或各屏蔽层的反射越大,则屏蔽效果越好。采用Cu/1Cr18Ni9Ti的金属屏蔽层结构,可获得良好的屏蔽效能及耐候性, 单纯用表面阻抗来评估多层金属膜的电磁屏蔽效果并不合适。
【Abstract】 A variety of double-layer have been successfully designed and grown by DC magnetron sputtering for the purpose of electromagnetic (EM) shielding of plastic chassis, based on the shielding efficiency calculation of an infinite shielding area with transmission line model. The shielding of all the double-layer was evaluated. The results show that the total attenuation loss is the leaner sum of each layer; reflection loss is indepenbent of the relative position of the layers; and that as the number of shielding layers increase and their reflection become stronger, the shielding improves. We suggest that Cu/1Cr18Ni9Ti multilayer show the best EM shielding and high erosion resistance and that it is not appropriate to evaluate the EM shielding with surface impedance only.
【Key words】 Plastic; EM shielding; Magnetron sputtering; Shielding effect; EMI;
- 【会议录名称】 全国薄膜技术学术研讨会论文集
- 【会议名称】全国薄膜技术学术研讨会
- 【会议时间】2006-09
- 【会议地点】中国北京
- 【分类号】TB43
- 【主办单位】中国真空学会