【作者】 尹金锒； 王德苗； 董树荣； 张兴义；

【Author】 YIN Jin-lang, WANG De-miao~*, DONG Shu-rong, ZHANG Xing-yi (Dept. of Information Science & Electronic Engineering, Zhejiang University, Hangzhou 310027)

【机构】 浙江大学信息与电子工程学系；

【摘要】 磁控溅射技术在薄膜制备领域的应用十分广泛,而溅射靶电流的稳定性极大的影响溅射镀膜的膜层质量。本文对于工业用巨型磁控溅射靶电流的不稳定因素进行了分析,设计并实现了靶电压的反馈控制系统,大大改善靶电压与反应气体流量之间的迟滞回线,增强了靶电压的可控制性,并在实际生产中得到成功应用。更多还原

【Abstract】 Magnetron Sputtering Technology has been applied in the field of film preparing widely, however, the quality of the film is influenced by stability of target current badly. This paper analyses the factors that influence the stability of target current in industrial application, and designs the feedback control system of target voltage, which improves the smoothness of the hysteresis curve of target voltage versus reactive gas flow, and improves the controllable performance. And the system has been applied successfully in industrial yield.更多还原