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Closed Draft无栅网离子源及其应用

Gridless Closed Draft Ion Source and its Application

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【作者】 王旭迪洪义麟徐向东刘颖付绍军

【Author】 Wang Xudi, Hong Yilin, Xu Xiangdong, Liu Ying, Fu Shaojun (National Synchrotron Radiation Lab, USTC, Hefei 230026 Faculty of Mechanical and Automobile Engineering, HFUT?Hefei 230009)

【机构】 中国科学技术大学国家同步辐射实验室

【摘要】 Closed draft无栅网离子源是1997年由AE公司首先实现商品化的新型离子源。由于没有栅网组成的离子光学系统,因此仅需一个电源使之具有结构简单,价格低廉,与反应气体兼容,易于获得大面积的均匀离子束等优点。对该离子源与传统离子源了比较,介绍了它的工作原理,重点分析了条形及圆形两种主要类型的结构与设计要点。综述了其在基片清洗、薄膜沉积、刻蚀等方面的应用。

【Abstract】 First gridless closed draft ion source was on the market by Advanced Energy in 1997. Due to elimination of the grids system, only one DC power supply is required can greatly improve the reliability, which make such ion source simple, cheap, reactive gas compatible and easy to achieve large-area uniform ion beam. The operating principle of the ion source was briefly discussed. Discussion focuses on the design considerations and structure of both linear and round multi-cell source. Its applications in substrate treatment, film deposition and etch are also reviewed.

  • 【会议录名称】 中国真空学会第六届全国会员代表大会暨学术会议论文摘要集
  • 【会议名称】中国真空学会第六届全国会员代表大会暨学术会议
  • 【会议时间】2004-11
  • 【会议地点】中国杭州
  • 【分类号】O572
  • 【主办单位】中国真空学会
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