【作者】 刘洪祥； 李凌辉； 申林； 熊胜明； 张云洞；

【Author】 LIU Hong-xiang, LI Ling-hui, SHEN Lin, XIONG SHeng-ming, ZHANG Yun-dong (Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209,China)

【机构】 中国科学院光电技术研究所；

【摘要】 通过单层和多层膜的实验模拟,研究了离子束溅射沉积速率和沉积时间的关系。在溅射镀膜的初始阶段,对于Ta2O5,沉积速率随时间增加而增大;对于SiO2,沉积速率随时间先显著地增加,随后逐渐地减小。结果表明,通过对高、低折射率各层的监控时间进行补偿,即可实现光学薄膜厚度的精确监控。更多还原

【Abstract】 In this paper, the rule of the deposition rate of films and the sputtering time was studied. In the preliminary stage of coating, for Ta₂O₅, its growth rate increases with the depositing time; but, for SiO₂, its growth rate increases firstly, and then decreases. Experiments showed that, by modifying the deposition time of the high-index and the low-index layers, this can realize the accurate thickness control of time-power monitoring of ion beam sputter depositing optical thin films.更多还原