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时间监控离子束溅射沉积光学薄膜的厚度修正
Thickness modify of time-power monitoring of ion beam sputter depositing optical thin films
【Author】 LIU Hong-xiang, LI Ling-hui, SHEN Lin, XIONG SHeng-ming, ZHANG Yun-dong (Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209,China)
【机构】 中国科学院光电技术研究所;
【摘要】 通过单层和多层膜的实验模拟,研究了离子束溅射沉积速率和沉积时间的关系。在溅射镀膜的初始阶段,对于Ta2O5,沉积速率随时间增加而增大;对于SiO2,沉积速率随时间先显著地增加,随后逐渐地减小。结果表明,通过对高、低折射率各层的监控时间进行补偿,即可实现光学薄膜厚度的精确监控。
【Abstract】 In this paper, the rule of the deposition rate of films and the sputtering time was studied. In the preliminary stage of coating, for Ta2O5, its growth rate increases with the depositing time; but, for SiO2, its growth rate increases firstly, and then decreases. Experiments showed that, by modifying the deposition time of the high-index and the low-index layers, this can realize the accurate thickness control of time-power monitoring of ion beam sputter depositing optical thin films.
- 【会议录名称】 2004年光学仪器研讨会论文集
- 【会议名称】2004年光学仪器研讨会
- 【会议时间】2004
- 【分类号】O484.1
- 【主办单位】中国仪器仪表学会