【作者】 林炳； 刘定权； 张凤山；

【Author】 LIN Bing, LIU Ding-quan, ZHANG Feng-shan (Shanghai Institute of Technical Physics,Chinese Academy of Sciences,Shanghai 200083,China)

【机构】 中国科学院上海技术物理研究所；

【摘要】 离子束刻蚀技术现在越来越多被应用在可见光乃至红外薄膜中,在这一技术中最为关键的环节就是如何精确地测量离子源对薄膜的刻蚀速率,此速率因不同材料不同工艺条件而变化。现在利用光谱测量与数据拟合的方法,能够快速简便地测定出被刻蚀的材料的物理厚度,从而标定离子束刻蚀的速率。更多还原

【Abstract】 Ion etch technology is being more and more used in fabricating visible and infrared thin film, the most important section of which is how to get the etch rate in etching optical thin film. The rate is greatly infected by different materials and parameters. We have combined spectrum measurement with data fitting to quickly obtain thickness of etched material, and then calculated the etch rate accurately.更多还原