【作者】 徐晔； 蔡珣； 陈秋龙； 沈耀；

【Author】 Ye Xu, Xun Cai, Qiulong Chen, Yao Shen School of Materials Science and Engineering, Shanghai Jiao Tong University, 200240

【机构】 上海交通大学材料科学与工程学院；

【摘要】 在利用磁控溅射方法制备Ti-Si-N膜的过程中,反应气体中氮气的分压是一个重要的参数。本文采用钛-硅复合靶,在不同氮气分压下制得了一系列Ti-Si-N膜,并借助能谱仪(EDS)、X射线衍射(XRD)、纳米压入仪和划痕仪对膜层的成分、结构和力学性能进行了分析。结果表明,少量氮气的加入能制得纳米硬度高达53GPa的Ti-Si-N膜。随着氮气分压的增加,纳米硬度逐渐下降。随着氮气分压的增加,膜层中TiN相和Si3N4相的比例减小,同时,TiN晶粒的平均尺寸也逐渐减少。这两个趋势的共同作用使得Ti-Si-N膜随氮气分压的变化发生非线性的变化。更多还原

【Abstract】 The N2 partial pressure is an important parameter in Ti-Si-N coatings deposition using magnetron sputtering. In this work, a series of Ti-Si-N coatings were prepared under the conditions of various N2 partial pressures using Ti-Si mosaic target. The composition, microstructure and mechanical properties are investigated using EDS, XRD and nanoindentation. The results indicated that the superhard Ti-Si-N coatings with the nanohardness of 53GPa can be achieved under a certain N2 partial pressure. With the increase of N2 partial pressure, the nanohardness of Ti-Si-N coatings, and the ratio of TiN phase to Si3N4 phase decrease, as well as the average size of TiN crystalline. Thus, the properties of Ti-Si-N coatings undergo a nonlinear change with the change of N2 partial pressure.更多还原