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薄膜材料X射线衍射物相分析与内应力测定
PHASE IDENTIFICATION AND INTERNAL STRESS DETERMINATION IN THIN FILMS BY X-RAY DIFFRACTION
【Author】 JIANG Chuan-hai,CHEN Shi-pu,XU Zu-yao (T. Y. Hsu)(School of Materials Science and Engineering,Shanghai Jiaotong University,Shanghai 200030,China)
【机构】 上海交通大学材料科学与工程学院;
【摘要】 基于不对称布拉格反射理论,介绍了薄膜材料二维X射线衍射分析方法,并对铝合金表面的TiN薄膜进行了分层掠射分析,证实了该分析方法的可行性。结合掠射、侧倾、内标及交相关函数定峰等技术,改进了常规X射线应力测量方法,测量了上述薄膜中的内应力,表明可显著提高内应力测量精度。
【Abstract】 Based on the non-symmetrical diffraction theory,a two-dimensional X-ray diffraction technique is presented in the present paper.The depth profile of the phases existing in a TiN film deposited on Al alloy substrate was analysed by using the glancing method,indicating the feasibility of the proposed technique The conventional X-ray diffraction method is improved in combination with glance incidence,side-inclination,internal standard and cross correlation function.It has been employed to the determination of internal stress in thin films and the results show an enhanced measuring accuracy.
【Key words】 Two-dimensional X-ray diffraction; Thin film; Depth profile of existing phase; Internal stress;
- 【会议录名称】 全国材料理化测试与产品质量控制学术研讨会论文专辑(物理测试部分)
- 【会议名称】全国材料理化测试与产品质量控制学术研讨会
- 【会议时间】2002-11
- 【分类号】TB383
- 【主办单位】中国机械工程学会理化检验分会、《理化检验》杂志社、上海材料研究所