【作者】 薛玉明； 刘维一； 朴英美； 李凤岩； 何青； 周志强； 孙云；

【机构】 南开大学光电子所；

【摘要】 采用对向孪生靶溅射ZnO:Al(ZAO)薄膜可减少等离子体对基底薄膜轰击损伤,沉积速率与结晶程度高;不同气压溅射的ZAO薄膜,其透光率在波长小于700nm时基本相同,在可见光范围内(400～700nm),都大于80%。其中,在550nm时的透过率大于90%;入射光大于700nm时,ZAO较厚的薄膜对红外的吸收更多;溅射气压为2Pa比1Pa沉积速率低,但薄膜电子迁移率较大、电阻率低,更适合做CIS薄膜太阳电池窗口层或透明导电膜。更多还原

【Abstract】 It can reduce the effect of the bombardment of the plasma on the base thin films , has high deposition speed and high crystal degree, using the twin targets to sputter ZnO: Al(ZAO)films. The transmission of the ZAO thin films deposited under different pressures is nearly identical at less than 700nm, and is all over 80% at 400 - 700nm (over 90% at 550 nm). The thicker ZAO thin films are of higher transmission at more than 700 nm. The deposition speed under the 2Pa sputter pressure is lower than that under the 1Pa sputter pressure, but the electron mobility of the thin films is higher, and the resistivity is lower. Therefore, the thin films deposited under the 2Pa sputter pressure are more suitable for the window layers of the CIS thin films solar cells or the transparent conductive thin films.更多还原