【作者】 朴美英； 薛玉明； 刘维一； 李凤岩； 何青； 孙云； 李长健；

【机构】 南开大学光电子所；

【摘要】 由于制备低阻ZnO时功率比较大(相对本征ZnO而言),故溅射对薄膜衬底轰击较大。为了尽量减少溅射带来的轰击影响,我们采用了孪生对靶直流溅射来制备低阻ZnO的工艺路线。通过XRD测量以及光学特性分析比较得出采用孪生对靶溅视比平面磁控溅射法优越。更多还原

【Abstract】 Because the power for depositing low resistance ZnO film was more than intrinsic ZnO film, the bombardment of spatter on the film was very large. In order to reduce the effect of spatter, we used twinborn targets, which were set opposite, in magnetic DC sputtering, for preparing low resistance ZnO. XRD and optical characteristic represented that the twinborn targets was better that plane magnetic DC sputtering.更多还原