【作者】 吴远大； 邢华； 郑伟； 刘国范； 张玉书；

【Author】 Wu Yuan-da, Xin Hua, Zheng Wei, Liu Guo-fan, Zhang Yu-shu Department of Electronics Engineering, Jilin University, Changchun, 130023

【机构】 吉林大学电子系光电子国家重点实验室；

【摘要】 本文采用火焰水解法（FHD）在Si片上快速淀积SiO₂厚膜材料,材料膜厚达到40μm以上,生长速度率达8nm/分钟,然后将该材料分别在真空中/空气气氛中高温致密化处理,获得了各种形态的二氧化硅厚膜材料,包括平整度好、光滑透明的玻璃态SiO₂厚膜材料.并利用XRD、SEM、电子显微镜等仪器对SiO₂膜的表面和膜厚进行了测试分析.更多还原

【Abstract】 The SiO2 thick films were deposited on silicon substrate by Flame Hydrolysis Deposition (FHD).The thickness of the films is up to 40μm, and the deposition speed is as high as 8 μm per minute. Then, the films were consolidated in electric furnaces both in vacuum and air ambience, and several kinds of states of silica were obtained, including of the uniform and transparent silica glass. Finally, the silica films were analyzed by meanings of XRD, SEM, microscope, etc.更多还原