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窄带Mo/Si多层膜反射镜

High spectral resolution Mo/Si multilayers working at the wavelength of 14 nm

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【作者】 吴文娟朱京涛王风丽张众王洪昌张淑敏王占山陈玲燕周洪军霍同林

【Author】 WU Wen-juan, ZHU Jing-tao, WANG Feng-li, ZhANG Zhong, WANG Hong-chang, ZHANG Shu-min, WANG Zhan-shan, CHEN Ling-yan Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China ZHOU Hong-jun, HUO Tong-lin National Synchrotron Radiation Laboratory, University Of Science and Technology of China, Hefei 230029, China

【机构】 同济大学精密光学工程技术研究所物理系国家同步辐射实验室中国科技大学

【摘要】 本文设计并制备了窄带Mo/Si多层膜反射镜,工作波长为14 nm。利用高反射级次和减小Mo 层厚度两种方法减小Mo/Si多层膜反射镜光谱宽度。对Mo层厚度分别为2 nm和3 nm的Mo/Si多层膜, 设计了反射级次分别从1到6的多层膜系。制备方法采用直流磁控溅射技术,在国家同步辐射光谱与计量站上测试。结果表明,带宽随着反射级次增加而减少,在同一反射级次,Mo层厚度为2 nm的多层膜反射光谱带宽小于Mo层厚度为3 nm的多层膜。Mo层厚度为2 nm,5级次Mo/Si多层膜反射镜,在14nm 处的光谱宽度为0.12 nm,反射率为18%。

【Abstract】 The Mo/Si narrowband multilayer mirrors were designed for normal incidence angle of 5° at the wavelength of 14 nm using the combination of decreasing the thickness of Mo layer and utilizing high reflectivity orders. Using a direct current magnetron sputtering, these Mo/Si multilayer mirrors working in the 1st, 2nd, 3rd, 4th and 5th orders for the thickness of Mo layer of 2 nm and 3 nm have been fabricated, and then measured on National Synchrotron Radiation Facility in Hefei, China. The spectral widths both decrease with the increase of the reflectivity order. At the same reflectivity order, the spectral width is less for the thickness of Mo layer of t_Mo=2 nm than that for t_Mo=3 nm. The spectral width has been reduced to 0.12 nm in the 5 order for t_Mo=2 nm, where the reflectivity is 18%.

【基金】 国家自然科学基金(60378021,10435050);教育部新世纪人才基金(NCET-04—0376);同济大学理科发展基金。
  • 【会议录名称】 中国光学学会2006年学术大会论文摘要集
  • 【会议名称】中国光学学会2006年学术大会
  • 【会议时间】2006-09
  • 【会议地点】中国广东广州
  • 【分类号】TH74
  • 【主办单位】中国光学学会
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