【作者】 张淑敏； 朱京涛； 王风丽； 张众； 沈正祥； 王占山； 周洪军； 霍同林；

【Author】 ZHANG Shumin, ZHU Jingtao, WANG Fengli, ZHANG Zhong, SHEN Zhengxiang, WANG Zhanshan Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China ZHOU Hong-jun, HUO Tong-lin National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China

【机构】 同济大学精密光学工程技术研究所物理系； 国家同步辐射实验室中国科技大学；

【摘要】 研究用不同清洗方法对硅基底表面粗糙度的影响,首先使用原子力显微镜(AFM)直接测量硅片表面粗糙度。然后,利用直流磁控溅射方法,在相同制备工艺条件下镀制Mo／Si多层膜,使用X射线衍射仪(XRD)对多层膜二级衍射峰进行摇摆曲线扫描,多层膜的散射信号越高,表明基底表面粗糙度越大。最后,利用同步辐射测量多层膜的反射率,间接表征基底的粗糙度,结果表明,超声清洗后镀制的多层膜反射率最高(68．6％@13．5nm),证明使用超声清洗方法得到的基底表面粗糙度最小,结论与 AFM,XRD等表征方法一致。更多还原

【Abstract】 The extreme ultraviolet (EUV) molybdenum/silicon (Mo/Si) multilayers were fabricated using the direct current magnetron sputtering method on different preparation substrate: (a) wiped method, (b) untreated and (c) ultrasonic cleaning method. To meet the requirement of comprehensive characterization of morphology of substrates for EUV multilayer, a suitable combination of different measuring techniques, such as atomic force microscopy (AFM), x-ray diffractometer (XRD) rocking curve and synchrotron radiation (SR) reflectance, were chosen. It is shown that the reflectance of x-ray multilayers is sensitive to the roughness and cleanness of the substrate from the SR measurement results, and the maximum reflectance of 68.6% at 13.5 nm was obtained using the substrate prepared by the ultrasonic cleaning method. It is demonstrated on the analysis according to the experimental results that the combination of surface characterization techniques using the AFM, x-ray scattering technique and SR characterization can be used for investigating the detail topography information of the substrate.更多还原