【作者】 黄国胜； 李艳秋；

【Author】 Guosheng huang, Yanqiu li* , (Institute of Electrical Engineering, Chinese Academy of Science, No.6 Bei-Er-Tiao, Zhong Guan Cun, Beijing 100080, PRC)

【机构】 中国科学院电工研究所；

【摘要】 本文针对分辨率为100nm的ArF光刻机,对100nm密集线条,在特定的投影物镜条件下,考虑环形照明和Quasar照明系统,应用仿真软件PROLITH8,分别在给定的光学焦深条件下,分析NILS随掩模台和承片台的运动标准偏差(MovingStandardDeviation-MSD)的变化趋势。以及在给定的NILS(NormalizedImageLog-Slope)条件下,分析掩模台和承片台的运动标准偏差(MSD)对DOF的影响。研究掩模台和承片台的运动标准偏差(MSD)对空气中成像质量的影响。我们的研究结果表明,当掩模台和承片台的运动标准偏差(MSD)大于12nm时,在环形照明条件下,当光学焦深为0.5μm时,NILS小于0.9,在Quasar照明条件下,当光学焦深为0.5μm时,NILS小于1。如果既要保证光学焦深为0.5μm,同时NILS要求>1.0,那么,掩模台和承片台的运动标准偏差(MSD)应该小于10nm。更多还原

【Abstract】 As we all know, lithography result depends on tow parts, the projectionperformance and resist technology. While the synchronization error is alwayspresented as MSD, which do degrade the image quality both in the air and in theresist. Now, we just focus on the impact of MSD on aerial image quality. Since theNILS is the best single metrics to judge the lithographic usefulness o f an aerial image,our research have discussed the MSD budget evaluated by NILS for the 100nm nodeunder the acceptable depth of focus. Our research shows that MSD budget shouldbe within 10nm for annular illumination, to get a acceptable Aerial image with a DOFof 0.4μm ~0.5μm, NILS of 1.0~1.1 under certain project optics. And if Quasarillumination is applied, MSD budget can reach 12nm, to get a acceptable Aerial imagewith a DOF of 0.4μm ~0.5μm, NILS of 1.0~1.2 under certain project optics.更多还原