【作者】 张飞； 李艳秋；

【Author】 :Fei Zhang, Yanqiu Li1 Institute of Electrical Engineering, Chinese Academy of Science, No.6 Bei-Er-Tiao, Zhong Guan Cun, Beijing 100080, PRC

【机构】 中国科学院电工研究所；

【摘要】 本文使用PROLITH、ProDATA、ProLE仿真软件,采用ArF激光器(波长=193nm)光源,针对100nm密集、半密集和孤立三种线条,对四极照明(QUASAR)方式下,各种光学参数配置在空气中成像所能获得焦深进行了仿真分析。根据仿真的结果给出了优化配置参数的范围,比较了三种线条曝光时的光学成像质量。分析了优化配置参数条件下,波前误差对光学焦深、焦点偏移(focusshift)、图像位置误差(imageplacementerror)的影响情况,仿真的结果可以为优化光学参数配置、公差分配提供参考依据。更多还原

【Abstract】 The impact of aberration of projection optics on ArF lithography performancefor 100nm node is presented in this paper. The simulation is completed using PROLITH,ProDATA, ProLE software tools. The three kinds of patterns including dense line,semi-dense line and isolated line are taken as exposure patterns. The quasar illumination isemployed in the simulation. This investigation is focus on the optimal opticalparameters setting, depth of focus(DOF), focal shift, image placement error when theaberration is taken into account. The simulation results can provide the detailedinformation to lens design.更多还原