节点文献
虚拟微电子工艺过程研究
VIRTUAL IC TECHNOLOGY
【作者】 赵新; 李亚威; 李明; 卢桂章; 刘景泰; 张蕾; 王晓娜;
【Author】 Zhao Xin Li Yawei Li Ming Lu Guizhang Liu Jingtai Zhang Lei Wang XiaonaInstitute of Robotics & Automatic Information System, Nankai University, Tianjin, 300071
【机构】 南开大学机器人与信息自动化研究所;
【摘要】 虚拟微电子工艺过程研究包括两部分内容:一方面,力图通过深入分析每一单步工艺过程的特点,建立起典型微电子工艺参数与所生成部件几何形状的关系,即工艺模型;另一方面,根据工艺模型,研究对应具体工艺过程,部件几何形状的部件剖面图和三维可视化方面实现问题。本文主要研究后一个问题,首先,针对淀积、刻蚀两个典型工艺过程分析了实现部件剖面图和三维可视化所必须解决的问题;其次,给出了基于线段生成的实现策略;最后,结合一个实际例子,给出了根据工艺模型自动生成其剖面图的实现方案及生成结果,从而验证了实现策略的可行性。
【Abstract】 There are two issues involved in the study of virtual IC technology. One is to analyze every single step in the procedure in details and set up relationship between the parameters of typical IC and geometry of the MEMS part, that is modeling IC technology. The other is implementation of cross section figure and 3D visualization of MEMS part based on IC technological model. The later issue is discussed in this paper. First, in allusion to the typical procedure of settling and etching, this paper analyzes the problems that must be resolved during implementation of cross section figure and 3D visualization of MEMS part. Secondly, it comes up with the strategy of implementation based on built line. Finally, combining with an actual example, it gives out the scheme of implementation and the final result that is built automatically on the basis of the technological model. Accordingly, the strategy of implementation is proved to be feasible.
【Key words】 virtual design; virtual IC technology; micro electro mechanical system;
- 【会议录名称】 中国图象图形学会第十届全国图像图形学术会议(CIG’2001)和第一届全国虚拟现实技术研讨会(CVR’2001)论文集
- 【会议名称】中国图象图形学会第十届全国图像图形学术会议(CIG’2001)和第一届全国虚拟现实技术研讨会(CVR’2001)
- 【会议时间】2001-05
- 【分类号】TN405
- 【主办单位】中国工程图学学会