【作者】 俞世吉；

【Author】 Yu Shiji (Institute of Electronics, Chinese Academy of Sciences, Beijing 100080)

【机构】 中国科学院电子学研究所；

【摘要】 本文采用感应耦合等离子体源(ICPS)成功地实现化学气相沉积硬质类金刚石(DLC)膜,并考察了基片负偏压对类金刚石膜沉积过程和薄膜性质的影响。薄膜的微观形貌、显微硬度、沉积速率以及结构成分分析表明感应耦合等离子体源适于制备硬质类金刚石膜,并且在相对较低的基片负偏压条件就可以获得高硬度的类金刚石膜。基片负偏压对类金刚石膜化学气相沉积过程和薄膜性质都有显著影响。更多还原

【Abstract】 Chemical vapor deposition of hard diamond-like carbon (DLC) films was achieved using an inductively coupled plasma source (ICPS). The microscopy, microhardness, deposition rate and structure characteristic of the DLC films were analyzed. It is showed that the ICPS is fit for hard DLC films deposition at relatively low substrate negative bias voltage. Substrate negative bias voltage greatly affects chemical vapor deposition of DLC films and its qualities.更多还原