【作者】 张跃飞； 张广秋； 王正铎； 葛袁静； 陈强；

【Author】 Zhang Yuefei Zhang Guangqiu Wang zhengduo Ge Yuanjing Chen qiang (Laboratory of Plasma Physics and Materials Beijing Institute of Graphic Communication Beijing 102600 China )

【机构】 北京印刷学院印刷包装材料与技术实验室；

【摘要】 研究了利用等离子体磁控溅射、多弧离子镀和离子束辅助沉积技术制备硬质铬薄膜,并薄膜的性能行了初步研究。结果显示,多弧离子镀和离子束辅助沉积技术制备硬质铬薄膜其硬度接近于电镀,薄膜表面致密均匀,且与基体结合良好。指出了等离子体表面技术可以作为替代电镀制备凹印版材的耐磨层的新工艺。更多还原

【Abstract】 The hard Cr films were deposited on Ni surface by means of magnetron sputtering, multi-arc ion plating and ion beam assisted deposition technique as a wear resistance layer of .gravure printing. The experiment results showed that films had high microhardness and the adhesion was good. The plasma surface engineering technology as a new processing of preparation of wearable layer of gravure printing can as a substitute for plating was pointed out.更多还原