【作者】 周友苏； 张立珊；

【Author】 , Zhou Yousu Zhang Lishan (Machine Electric Academy of Beijing Union University, Beijing 100020,China)

【机构】 北京联合大学机电学院；

【摘要】 在真空条件下利用真空电弧源在不同基底材料上镀制了TiO2薄膜。对影响镀膜过程和膜层质量的氧气工作压强和偏压等因素进行了研究。X射线衍射结构分析结果显示TiO2薄膜主要以锐钛矿相为主及少量的金红石相。对TiO2薄膜的物理性质、化学性质进行了初步检测。更多还原

【Abstract】 Titanium dioxide thin film on different bases were deposited by the vacuum plating with the cathode electric source. The working pressure of oxygen and biast as influences on the depositing process and the quality of the thin film was studied. The configuration of the TiO2 film was main anatase and a little rutile inspected by x-ray diffraction analysis. A preliminary check of the physical property and the chemical property of the film was made out.更多还原