节点文献

Ti掺杂DLC薄膜的制备及其摩擦学性能研究

Preparing and tribology of Ti-doped DLC films deposited by FCVA

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 王鹏陈友明张广安刘维民张俊彦

【机构】 中国科学院兰州化学物理研究所固体润滑国家重点实验室兰州大学等离子体与金属材料研究所

【摘要】 利用阴极磁过滤,分别在不锈钢(1Crl8Ni9Ti)和单晶硅基体上制备Ti掺杂复合DLC(TiC/a-C:H)薄膜,分别利用Raman光谱、XPS和TEM对薄膜组成及其结构进行了分析,利用纳米压入对薄膜力学性能进行了研究。结果表明:制备的Ti掺杂DLC薄膜,具有典型的含氢类金刚石薄膜的特征:薄膜表面均匀致密;CH4气体流量小于40Sccm时,薄膜中没有sp杂化C出现,随着CH4气体流量的增加,薄膜中sp3含量增加。调节基底偏压,在-150V制备的薄膜具有最小的IP/IG 值,最高的硬度,对应其减摩抗磨效果最好。

【Abstract】 Ti-doped hydrogenated diamond-like carbon (DLC) films were deposited on stainless steel substrates by a filtered cathodic vacuum arc (FCVA) method using Ar and CH4 as the feedstock. The effects of the methane flow rate and the negative bias voltage on the characterization of the DLC films were investigated. Result show that the surface roughness and deposition rate decreases with increasing methane flow rate or negative bias voltage applied to the substrate. Raman spectroscopy results show that the films did not show Raman scattering for methane flow rate below 40sccm, and sp3 content increased with methane flow rate increasing and reached the maximum value at the 100sccm methane flow rate as bias voltage maintained at a constant -150V. As negative bias voltage changing and maintained methane flow rate at 100sccm, the sp3 content reached the maximum value at -150 bias voltage, after which it decreased and more graphite-like bonds feature produced with further increase of the negative bias voltage. And the films deposited on this condition show very low coefficient of friction and long wear life.

【关键词】 类金刚石碳膜Ti掺杂结构摩擦学性能
  • 【会议录名称】 2006全国摩擦学学术会议论文集(三)
  • 【会议名称】2006全国摩擦学学术会议
  • 【会议时间】2006-07
  • 【会议地点】中国黑龙江哈尔滨
  • 【分类号】TB43;O484.4
  • 【主办单位】中国机械工程学会摩擦学分会
节点文献中: 

本文链接的文献网络图示:

本文的引文网络