【作者】 段弢； 杨晓燕； 李春芳； 张纪岳；

【Author】 DUAN Tao~(1.2) YANG Xiao-yan~1 LI Chun-fang~(1.2) ZHANG Ji-yue~1 ~1State Key Laboratory of Transient Optics Technology.Xi’an Institute of Optics and Precision Mechanics.The Chinese Academy of Sciences.Xi’an.Shaanxi 710068.China ~2Graduate School of the Chinwse Academy of Sciences.Beijing 100039.China ~3Department of Physics.Shanghai University,Shanghai 200444,China

【机构】 中国科学院西安光学精密机械研究所瞬态光学技术国家重点实验室；

【摘要】 光在受抑全内反射过程中 Goos-Hmchen(GH)位移会由于光在第三个区域中的耦合输出而减小。而在镀有电介质膜的受抑全反射结构中,由于光在介质膜内的共振,可使反射光束、透射光束的 GH 位移得到极大的增强。在共振点上,光疏介质内的衰减场强也会得到增强。为了测量增强的衰减场,可采用具有耦合输出的类似于受抑全内反射的结构。研究表明,在此结构中反射光束和透射光束 GH 位移与入射角大小及薄膜厚度有关,当空气层达到一定厚度时．反射光束的位移等于透射光束位移的两倍。更多还原

【Abstract】 It is predicted that the Goos-Hnchen(GH)shift of both reflected and transmitted light beams in the sketch of thin-film frustrated total reflection can be resonantly enhanced.At same time the evanescent wave field in the medium of lower refractive index is still enhanced.In order to measure enhanced evanescent wave field,sketch of frustrated total reflection is used.The results indicate that the GH shifts of reflected and transmitted wave beams can be modulated by changing incident angle and the thickness of the thin film.When the thickness of the vacuum layer satisfies some condition,the GH shift of transmitted beams are half approximately of the reflected beam.更多还原