【作者】 韩敬华； 杨李茗； 刘民才； 刘义彬； 王忠凯； 高耀辉； 冯国英；

【Author】 HAN Jing-hua~1 YANG Li-ming~2 LIU Min-cai~2 LIU Yi-bing~2 WANG Zhong-kai~1 GAO Yao-hui~1 FENG Guo-ying~2 ~1School of Electronics and Information Engineering.Sichuan University,Chengdu,Sichuan 610064,China ~2Chengdu Fine Optical Engineering Research Centre,Chengdu,Sichuan 610041.China

【机构】 四川大学电子信息学院； 成都精密光学工程研究中心；

【摘要】 针对超精密光滑光学元件加工过程中容易出现的粗糙度较大和表面疵病较多的现象,对传统抛光机理和抛光过程中抛光粉的主要参量对抛光质量的影响进行了研究。研究表明：抛光表面水解层对超光滑表面的形成有重要意义,超大、超硬抛光颗粒是超光滑表面疵病的主要原因。并根据抛光粉的主要参量随抛光时间的变化规律提出抛光周期的概念和对抛光粉进行预处理的抛光方法,即利用抛光初期对抛光粉进行顶处理、利用抛光中期进行工件抛光的加工方法。实验结果表明用预处理的方法确实可以有效地降低抛光元件的表面粗糙度和减小表面疵病的出现几率,提高加工的质量和效率。更多还原

【Abstract】 In view of the phenomena that the easy appearance of serious roughness and surface defects,the polishing mechanism and the influence of the main parameters on the polishing quality are researched.The research indicates:the superficial hydrolysis layer on the polishing surface has the vital significance to the formation of ultra smooth surface.The super big and hard grains of the polishing powder are the main reason of the surface defects.According to the variational law of the polishing powder’s main parameters with polishing time,the concept of polishing cycle and the method of pretreatment on the polishing powder are proposed. viz.the polishing powder is pretreated on the initial stage period and the workpiece is polished on the intermediate stage.The experimental result indicates:this method can truly reduces surface roughness and the surface defect,and the polishing quality and efficiency are effectively enhanced.更多还原