【作者】 方国家； 姚凯伦； 王豫； 刘祖黎；

【Author】 Fang Guojia Yao Kailun Wang Yu Liu Zuli Fang Guojia Doctor Candidate; State Key Lab of Laser Technology. HUST. Wuhan 430074, China.

【机构】 华中理工大学激光技术国家重点实验室； 华中理工大学物理系；

【摘要】 采用高真空热蒸发沉积技术在硅单晶Si（111）衬底上沉积了WO₃薄膜,借助化学刻蚀,SEM.XRD和Raman光谱分析等手段,研究了不同的热处理条件（大气环境,真空,不同气氛）对WO₃薄膜结构的影响。结果表明,在真空条件下或干燥Ar气氛条件下对薄膜进行退火热处理有利于控制薄膜晶粒的生长（保持薄膜良好的电致变色性能）,同时有利于增强薄膜的稳定性。更多还原

【Abstract】 WO₃ thin films are deposited on Si （111） by the high vacuum thermal evaporation method. Thin films are heat-treated at different temperatures and ambient atmosphere （such as in vacuum, dry or wet Argon）. The microstructure, morphology of the samples before and after heat treatments have been studied with chemical etching, SEM, XRD and Raman Spectrum. The experiment illustrates that grain growth in the samples annealed in vacuum or dry argon flow conditions can be controlled. The thin films have good electrochromic properties and improved stability.更多还原