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磁控溅射制备锌薄膜的工艺与分析
Process and analysis of magnetron sputtering on zinc film
【Author】 LIU Yan-hui CEN Shao-yi ZHOU Xi-ying (Department of Material Science and Engineering,Shanghai University of Engineering and Science,Shanghai 201620,China)
【机构】 上海工程技术大学材料工程学院;
【摘要】 用扫描探针分析技术,研究了直流磁控溅射工艺参数对锌薄膜形态与生长的影响。结果表明,随着衬底温度和直流溅射功率的降低,锌薄膜表面形成了细密的锌岛;当溅射氩气压发生变化时,锌薄膜表面锌岛的尺寸没有明显变化,但表面粗糙度和垂直衬底最高落差随着氩气压的升高而升高。
【Abstract】 Effects of process parameter of DC magnetron sputtering on zinc film was analyzed by scanning probe microscope.Results show that fine zinc salience was formed on the surface of zinc film,with fall of substrate temperature and power of DC magnetron sputtering.When Ar pressure was raised,size of zinc salience does not obviously change,surface roughness and the highest throw which is normal to substrate gone up.
【Key words】 magnetron sputtering; film; scanning probe microscope; zinc;
- 【会议录名称】 2008全国功能材料科技与产业高层论坛论文集
- 【会议名称】2008全国功能材料科技与产业高层论坛
- 【会议时间】2008-10
- 【会议地点】中国天津
- 【分类号】TN304.055
- 【主办单位】天津大学、中国仪器仪表学会仪表材料学会、《功能材料》学术期刊编辑部、《功能材料信息》学术·技术期刊编辑部