【作者】 肖华； 王华； 任鸣放； 许积文；

【Author】 XIAO Hua , WANG Hua, REN Ming-fang, XU Ji-wen (Dep. of Telecommunication and Information Eng. ,Guilin Univ. of Electronic Technology ,Guilin 541004, China; Dep. of Information Material Science and Eng. , Guilin Univ. of Electronic Technology , Guilin 541004,China)

【机构】 桂林电子科技大学通信与信息工程系； 桂林电子科技大学信息材料科学与工程系；

【摘要】 以纳米级ZnO和Al2O3为基础粉料,采用模压+常压固相烧结的方法制备ZAO靶材,研究了烧结工艺对于靶材微观结构和性能的影响,并对其烧结机理进行了探讨分析。研究表明:过高的烧结温度容易造成第二相的生成和晶粒粗大,以致影响靶材的性能;在1150-1300℃内,靶材的密度随着烧结温度的上升而明显增大,上升趋势在1300℃后变缓; 1300℃下烧结6h,可以制得结构均匀、致密度达 99．42％的ZAO靶材;ZAO靶材的显微硬度随烧结温度的升高在1250℃达到最大值946MPa,但继续升高烧结温度靶材的显微硬度却有所降低。更多还原

【Abstract】 ZAO compound nano-powder is made by Al2O3 mechanically-mixed in zinc oxide. ZAO sputtering target is prepared by pressureless solid-state sintering after molding pressing in the air. Phase structure and micro structur of ZAO target is analysed during sintering process. The optimum sintering parameters and sintering mechanism of ZAO target are obtained by investigating the effect of sintering technology on ZAO target. The experiment indicated that too high sintering temperature results in grains’ growing up easily, even the second phase nucleation so that it can worsen the properties of ZAO target. The density of ZAO target becomes obviously higher from 1150℃ to1300℃, and the rising-trend becomes slower after 1300℃. ZAO target can acquire higher relative density(99. 42%) and microstructure uniformity at 1300℃ at least 6h. The effect of sintering technology on hardness of ZAO target is discussed at last. The hardness of ZAO target has a maximum value of 946MPa, when sintered at 1250℃ , however, it falls with higher temperature over 1250℃,更多还原