【作者】 滕文华； 李德元； 张义顺；

【Author】 TENG Wenhua~1; LI Deyuan~2; ZHANG Yishun~2 (1. Institute of Machinery Manufacture Technology, CAEP, 621900; 2. Shenyang Institute of Technology, 110023)

【机构】 中国工程物理研究院机械制造工艺研究所； 沈阳工业大学；

【摘要】 在等离子弧喷涂过程中,要求电流在喷涂开始时有递增和结束后有衰减的过程。在以可编程控制器为核心的喷涂主控系统里,通过模拟量输入输出模块EM235和CF2B-2A型可控硅触发器及辅助电路,利用PLC程序实现了喷涂电流的递增、衰减过程。更多还原

【Abstract】 During the plasma arc spraying, the current must have the course of increasing progressively at the beginning of spraying and attenuation by the end of spraying. In the spraying control system that takes the programmable controller as the center, the course of spraying current increasing progressively and attenuation was realized by using the imitating capacity input output module EM235, silicon controlled rectifier trigger CF2B-2A and its assisted circuit, and PLC procedure.更多还原