【作者】 林松盛； 林凯生； 朱霞高； 李洪武； 侯惠君； 代明江； 赵利；

【Author】 Lin Songsheng Lin Kaisheng Zhu Xiagao Li Hongwu Hou huijun Dai Mingjiang Zhao Li (Guangzhou Research Institute of non-ferrous Metals,Guangdong Guangzhou 510651)

【机构】 广州有色金属研究院；

【摘要】 采用阳极层流型矩形气体离子源结合中频磁控溅射技术制备梯度过渡Cr-DLC膜层。利用扫描电镜、显微硬度计、球-盘摩擦磨损实验仪及划痕试验仪对不同工艺制备的Cr～DLC膜层的部分机械性能进行分析对比。结果表明:Cr-DLC膜层的附着性能在CH₄/Ar流量比为100/150时为最佳,随着中频功率的增大膜层的附着性能下降;硬度随CH₄流量的增大及中频功率的提高,皆呈先上升后下降;在一定范围内CH₄流量的变化对Cr-DLC膜层的摩擦系数影响不大,中频功率的增加膜层的摩擦系数呈上升趋势。更多还原

【Abstract】 Gradual Cr-DLC films were synthesized by combing laminar flow type anode rectangular gas ion source and middle frequency magnetron sputtering technology.SEM,micro -hardness tester,friction wear tester and scratching tester were used to analysis the mechanical performance of films deposited by different process methods.The result showed that:Cr-DLC films deposited with good adhesion under 100/150 flow rate of CH₄/Ar.The adhesion of films decreased as middle frequency power increasing.The hardness of films declined after rising as the increasing of CH₄/Ar flow-rate and middle frequency power.The friction coefficient of films was slightly influenced by the change of CH₄flow,well,increased as middle frequency power increasing.更多还原