【作者】 廖艳； 霍纯青； 蔡惠平； 陈强；

【Author】 LiaoYan Huo Chunqing Chen Qiang (Laboratoey of plasma Physics and Materials,Beijing Institute of Graphic Communication,Beijing 102600,China)

【机构】 北京印刷学院印刷包装材料与技术北京市重点实验室等离子体物理及材料研究室；

【摘要】 以HMDSO为单体,氩气为反应气体,采用磁控溅射等离子体技术在单晶硅,载玻片,KBr基片等的表面制备Ag/SiO₂纳米复合物。用傅立叶红外透射光谱（FTIR）,原子力显微镜（AFM）等手段对纳米复合物薄膜进行结构、亲疏水性和形貌分析。着重研究了等离子体工艺参数,工作气压等对沉积薄膜结构性能的影响。更多还原

【Abstract】 With HMDSO as monomer and Ar as a diluated gas,Ag/SiO₂ nanocomposite is prepared on silicon wafer （p-Si（100））,glass slide,KBr uropatagia and so on,by using magnetron sputtering plasma technology with assisted by inductively coupled plasma.The nanocomposite structure,hydrophilic or hydrophobic property,and surface topography are detected by FTIR,AFM.And film structure affected by the plasma technological parameter,especially,working pressure and so on were all investigated in ths paper.更多还原