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Ge20As25Se55非晶半导体薄膜光致结构变化及其飞秒光克尔效应

PHOTOINDUCED CHANGES OF STRUCTURE AND FEMTOSECOND OPTICAL KERR EFFECT IN Ge20As25Se55 FILMS

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【作者】 刘启明赵修建干福熹米君钱士雄

【Author】 Liu Qiming Zhao Xiujian Key Laboratory of Silicate Materials Science and Engneering (Wuhan University of Technology),Ministry of Education,Hubei Wuhan 430070 Fuxi Gan Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,RO.Box 800-211,Shanghai,201800,R R.China School of Information Sciences and Engineering,Fudan University,Shanghai 200433,RR.China Jun Mi Shixiong Qian Department of Physics,Fudan University,Shanghai 200433,RR.China

【机构】 武汉理工大学硅酸盐材料工程教育部重点实验室中国科学院上海光学精密机械研究所复旦大学物理系

【摘要】 运用X 射线衍射分析(XRD)、红外光谱分析(IR)和透射光谱分析,研究了Ge20As25Se55非晶半导体薄膜经514.5nm 波长的氩离子激光辐照后的结构及性能变化。实验结果表明,经热处理和激光辐照后,在薄膜中观察到光致漂白效应,即薄膜的光学吸收边均移向短波长处(绿移),并且随着辐照激光强度和辐照时间的增大而增大。利用超外差—光克尔效应法测得薄膜的三阶非线性实部和虚部值分别为6.6×10-12 esu 和-2.4x10-12 esu,其非线性响应时间小于200fS。

【Abstract】 The changes of structure in Ge20As25Se55 amorphous semiconductor films by light illumination from Ar ion laser were studied with the XRD,IR and transmission spectra analysis.It was indicated that the optical absorption edges of films shifted to shorter wavelength according tolight illumination.The magnitude of shift increased with the increase of the intensity ofillumination light and the illumination time.By sides,Ge20As25Se55films were studiedexperimentally by the method of the femtosecond optical heterodyne detection of optical Kerreffect.The real and imaginary parts of complex third-order optical nonlinearity was effectivelyseparated and their values and signs could be also determined,which were 6.6×10-12 esu and-2.4×10-12 esu,respectively.Amorphous Ge20As25Se55 films showed a very fast response in therange of 200 fs under ultrafast excitation.

  • 【会议录名称】 2005中国硅酸盐学会特种玻璃分会学术研讨会会议论文集
  • 【会议名称】2005中国硅酸盐学会特种玻璃分会学术研讨会
  • 【会议时间】2005-10
  • 【会议地点】中国北京
  • 【分类号】TN304
  • 【主办单位】中国硅酸盐学会特种玻璃分会
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