【作者】 程玉贤； 王文； 朱圣龙； 王福会；

【Author】 CHENG Yu-xian WANG Wen ZHU Sheng-long WANG Fu-hui (State Key Laboratory for Corrosion and Protection,Institute of Metal Research,Chinese Academy of Sciences, Shenyang 110016,China)

【机构】 腐蚀与防护国家重点实验室中国科学院金属研究所；

【摘要】 γ-TiAl基金属间化合物有低密度,较高弹性模量以及良好的高温强度,抗蠕变性能,在航空航天和汽车工业上有着良好的应用前景,是Ni基高温合金的替代材料。但是γ-TiAl在800℃以上抗氧化性能较差,制约了它作为高温结构材料的应用。NiCrAlY涂层能提高γ-TiAl的抗氧化性能,但是它和基体会发生严重的互扩散。本文采用磁控溅射技术在γ-TiA上沉积2-3μm的Ta,再利用多弧离子镀技术沉积40μm左右的NiCrAlY涂层,然后在1000℃对试样进行退火处理。通过SEM和XRD等分析手段表明,Ta不能有效阻止γ-TiAl和NiCrAlY涂层之间的互扩散。更多还原

【Abstract】 γ-TiAl based alloys are promising candidates for structural materials.However their poor oxidation resistance at temperatures higher than 800℃restrains their practical use.NiCrAlY can remarkably improve the oxidation resistance of TiAl though serious inward diffusion of Ni from the NiCrAlY coating to the substrate affects the useful life of NiCrAlY.In this paper a Ta interlayer was deposited employing magnetron sputtering between NiCrAlY coating andγ-TiAl substrate as a diffusion barrier.The effect of the diffusion barrier on the interdiffusion of the alloying elements of theγ-TiAl /Ta/NiCrAlY system was investigated at 1000℃for various time.The phase constitution of the diffusion layers in the interdiffusion zone was identified by XRD and EDS.It seems that the Ta interlayer cannot retard the inward diffusion of Ni effectively.更多还原