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基于Atemga128的磁控溅射镀膜机
Design of sputtering vacuum machine based on the Atemga128
【Author】 LIU Yan-tao MA Jian-ping (Xi’an University of Technology Institute of Automation,710048)
【机构】 西安理工大学自动化学院;
【摘要】 介绍应用于石英晶体谐振器制造的双靶真空镀膜机,以Atemga128单片机为核心,与上位机进行数据传递,真空镀膜包括真空获得、电离清洗、磁控溅射等工艺过程,可实现多种金属电极的镀膜要求,并实现谐振器的制造工艺要求。
【Abstract】 Introduce double-target sputtering vacuum machine,it’used in the manufacturing of quartz crystal, MCU as the core to Atemga128 with the host computer for data transmission,is designed to obtain a vacuum, ionization cleansing,magnetron sputtering process control.The sputtering vacuum machine to achieve a variety of metal electrode manufacture requirements,and the realization of quartz resonator manufacturing process requirements.
- 【会议录名称】 第九届真空冶金与表面工程学术会议论文摘要集
- 【会议名称】第九届真空冶金与表面工程学术会议
- 【会议时间】2009-08-24
- 【会议地点】中国辽宁沈阳
- 【分类号】TB43
- 【主办单位】中国真空学会真空冶金专业委员会(Vacuum Metallurgy Committee of Chinese Vacuum Society)、沈阳市真空学会(ShenYang Vacuum Society)