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低能离子注入对花粉外壁的刻蚀作用
The Effects of Low-Energy Ion Implantation on Pollen Exine Substructure of Cedrus deodara
【Author】 LI Guo-Ping , YANG Lu-Sheng (Department of Environment and Life science, Putian University, Putian 351100, Fujian, China)
【机构】 莆田学院环境与生命科学系;
【摘要】 为了在细胞水平探讨低能离子注入产生生物学效应的机制,以能量为30keV、注入剂量为1×1015ions/cm2-15×1015ions/cm2的低能氮离子注入雪松花粉材料,研究了低能氮离子注入对花粉外壁亚结构的影响。用原子力显微镜观察花粉外壁亚结构的结果表明:原子力显微镜可在微米至纳米水平揭示离子注入对花粉外壁的刻蚀作用,离子注入对花粉外壁的刻蚀程度与离子剂量呈正相关,认为一定能量、剂量的离子注入可仅引起花粉壁破裂而不伤害花粉壁内结构。本研究可为离子束介导转基因技术提供了依据。
【Abstract】 The aim of this study is to investigate the biological effects of ion beams on pollen.Pollen grains of Cedrus deodara were implanted with 30 keV nitrogen ion beams at doses ranging from 1 ×1015 ions/cm2 to 15 ×1015 ions/cm2. The effects of N implantation on the pollen exine substructure were examined using an atomic force microscope (AFM). AFM observations distinctly revealed the erosion of the pollen exine caused by N implantation in the micrometer to nanometer range. Typical results showed that the erosion degree was linearly proportional to the ion dose. Our results suggest that low energy ion implantation with suitable energy and dosage can be used to break the pollen wall to induce a transfer of exogenous DNA into the pollen without any damage to the cytoplasm and nuclei of the pollen. The present study suggests that a combination of the method of ion-beam-induced gene transfer and the pollen-tube pathway method (PTPW) would be a new plant transformation method.
- 【会议录名称】 第九届全国植物结构与生殖生物学学术研讨会论文摘要集
- 【会议名称】第九届全国植物结构与生殖生物学学术研讨会
- 【会议时间】2010-05-15
- 【会议地点】中国陕西西安
- 【分类号】Q943
- 【主办单位】中国植物学会植物结构与生殖生物学专业委员会