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双波长激光高反射薄膜设计与实验的初步研究

Preliminary Studies on Design and Experiment of High Reflection Coating for Double Wavelength Laser

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【作者】 刘华松王占山季一勤沈正祥马彬程鑫彬焦宏飞刘丹丹洪伟

【Author】 Liu Huasong 1,2,Ji Yiqin 2,3,Wang Zhanshan 1,Shen Zhengxiang 1,Ma Bin 1,Cheng Xinbin 1,Jiao Hongfei 1,Liu Dandan 2,Hong Wei 2 (1.Institute of Precision Optical Engineering,Tongji University,Shanghai,200092,China) (2.Tianjin Key Laboratory of Optical Thin Film,Tianjin Jinhang Institute of Technology Physics,Tianjin,300192,China)

【机构】 同济大学精密光学工程技术研究所天津市薄膜光学重点实验室,天津津航技术物理研究所

【摘要】 双波长反射膜元件是双向端面泵浦的折叠腔倍频固体激光器中的重要元件之一。选择Ta2O5和SiO2两种薄膜材料,通过调整两层膜光学厚度的比例实现了532nm和1064nm波长反射膜的设计,详细计算与分析了两层膜的比例对反射膜的带宽和两波长的反射率的影响,确定最佳的比例为1:3。通过调整表面几层的光学厚度比例,将两个波长的相对电场强度极大值移开界面,得到了最终的膜层结构。采用离子束溅射沉积技术制备了设计的双波长反射膜,分析了分光光度计测试的背景噪声,测试得到反射光谱和透射光谱,对实验结果可认为在两个波长的反射率均大于99.8%。最后针对分光光度计的测试精度,讨论了高精度反射膜的测试方法。

【Abstract】 Double wavelength reflection coating element is one of the important elements of double end-pumped intra-cavity-frequency-doubled solid state laser.With Ta 2 O 5 and SiO 2 as thin film materials,532nm and 1064nm doubled wavelength reflection film design is obtained by adjusting the ratio of the two layers optical thickness.The influence of the ratio on the bandwidth and the reflectance of both the wavelengths is calculated and analyzed,and the optimal ratio is 1:3.By adjusting the ratio of the optical thickness of the surface layers,the maximum relative electric field intensities of the two wavelengths are withdrew away from the interface,and the optimal film structure is gained.Ion beam sputtering deposition technology is applied in the preparation of the design.The reflectance and transmission spectrum are given with the analysis of the spectrometer background noise.The experimental results show that the reflectance of both wavelengths is better than 99.8 %.Finally,Focused on the test precision of the spectrophotometer,the test method of the high-precision reflection film is discussed.

【基金】 国家863计划课题2006AA12Z139;上海市科委项目07DZ22302;天津市科委项目10JCYBJC01500
  • 【会议录名称】 中国光学学会2010年光学大会论文集
  • 【会议名称】中国光学学会2010年光学大会
  • 【会议时间】2010-08-23
  • 【会议地点】中国天津
  • 【分类号】O484.41
  • 【主办单位】中国光学学会
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