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玻璃基底上制备多孔氧化铝薄膜的研究

Study on the Fabrication of Porous Alumina Film on Glass

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【作者】 赵立新夏志林薛亦渝郭培涛彭桦李展望

【Author】 Zhao Lixin,1 Xia Zhilin 1,2 Xue Yiyu 1,3 Guo Peitao 3 Peng Hua 1 Li Zhanwang 1 (1 School of Material Science and Engineering,Wuhan University of Technology,Wuhan,Hubei 430070,China) (2 Key Laboratory of Low Dimensional Materials and Application Technology of Ministry of Education,Xiangtan University,Xiangtan,Hunan 411105,China) (3 School of Automobile Engineering,Wuhan University of Technology,Wuhan 430070,China)

【机构】 武汉理工大学材料科学与工程学院湘潭大学低维材料及其应用技术教育部重点实验室武汉理工大学汽车工程学院

【摘要】 多孔光学薄膜有较高抗激光损伤能力,在玻璃基底上制备的多孔氧化铝光学薄膜,可以用做研究多孔膜抗激光损伤机理的试样。采用电子束蒸发和阳极氧化法,在BK-7光学玻璃基底上制备出了孔径大小可调、孔隙率可调、孔分布均匀的多孔氧化铝光学薄膜。用扫描电子显微镜(SEM)和分光光度计表征了薄膜的形貌和透射率。结果表明:电子束蒸镀的铝膜表面质量比电抛光的铝箔表面质量差;二次氧化法比一次氧化法更易得到规整的孔结构;与硫酸和草酸电解液相比,在磷酸电解液中制备的多孔氧化铝薄膜具有较大的孔径,更高的孔隙率;退火有利于多孔氧化铝薄膜透射率的提高。

【Abstract】 Porous optical film with high laser damage resistance ability was fabricated on glass could be used as the specimen to invest the high laser resistance mechanism of porous film.Porous alumina optical film with controllable pore diameter,porosity and highly ordered pore arrangement was fabricated on BK-7 optical glass by electron-beam evaporation and anodic oxidation.The surface morphology and transmittance of the film were examined by scanning electron microscope (SEM) and the spectrophotometer,respectively.The results indicate that the surface quality of electron-beam-evaporated aluminum film is much worse than electrochemically polished Al foil.A two-step anodization can more easily get regular pore structure than the first anodization.Compared with sulfuric acid and oxalic acid solutions,porous anodic alumina film prepared by electrochemically anodizing aluminum film in phosphoric acid solutions has larger pore diameter and higher porosity.The transmittance of porous anodic alumina film increases after annealing.

【基金】 国家自然科学基金(10804090;10974150))资助项目,“低维材料及其应用技术教育部重点实验室”开放课题资助课题(KF0908)
  • 【会议录名称】 中国光学学会2010年光学大会论文集
  • 【会议名称】中国光学学会2010年光学大会
  • 【会议时间】2010-08-23
  • 【会议地点】中国天津
  • 【分类号】O484.41
  • 【主办单位】中国光学学会
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