【作者】 孔磊； 胡会利； 于元春； 侯峰岩； 屠振密；

【Author】 Kong Lei~1,Hu Huili~1,Yu Yuanchun~1,Hou Fengyan~2,Tu Zhenmi~1 1.Applied Chemistry Department of Harbin Institute of Technology at Weihai,Weihai,264209 2.Shanghai Baosteel Equipment Maintenance Co.Ltd.,Shanghai,201900

【机构】 哈尔滨工业大学(威海)应用化学系； 上海宝钢设备检修有限公司表面技术研究所；

【摘要】 通过单因素试验研究了直流电镀和脉冲电镀时工艺参数对镀铬层粗糙度的影响。直流电镀时,镀层粗糙度随电流密度的增大而增大,pH较低时镀层粗糙度的增大较明显。基体粗糙度对镀层粗糙度也具有较大的影响。脉冲电镀时,占空比、频率、平均电流密度对镀层粗糙度的增大都有较大影响。占空比为40%、频率为80 Hz,镀层粗糙度的增大最显著。镀铬层的微观形貌呈现出半球状突起密布的形态。脉冲条件下,镀层表面凸起数量更多、形状和大小更一致。更多还原

【Abstract】 The influencing of technological parameters of direct current and pulse current on chromium coating is studied through single factor experiment.The coating roughness increases with the increasing of dirent current density and the increasing of the roughness is remarkable when pH value is low. The roughness of substrate also has big effect on the coating roughness.Pulse frequency,duty ratio and average current density all have great influence on the increasing of coating roughness in pulse electrodeposition.And the increasing of coating roughness is the most significant when duty ratio is 40% and frequency is 80 Hz.There are many dense hemispherical tumors on the surface of chromium coating by micro-morphology.The chromium coating obtained by pulse electrodeposition has more tumors,and the shape and size of the tumots are more uniform than which by direct plating.更多还原