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离子液体中电沉积Tb-Fe合金的研究

Electrodeposition of Tb-Fe Alloy from an Ionic Liquid

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【作者】 苏彩娜安茂忠杨培霞谷红微

【Author】 SU,Cai-Na~1,AN,Mao-Zhong~(1*),YANG,,Pei-Xia~(1,2),GU,Hong-Wei~1 (1.School of Chemical Engineering and Technology,Harbin Institute of Technology,Harbin 150001,P.R.China; 2.Research Station on Material Science and Engineering for Postdoctoral Fellows,Harbin Institute of Technology,Harbin, Harbin 150001,P.R.China)

【机构】 哈尔滨工业大学化工学院哈尔滨工业大学材料科学与工程博士后流动站

【摘要】 以离子液体1-丁基-3-甲基咪唑四氟硼酸盐(BMImBF4)为电解液,采用脉冲技术研究了Tb-Fe合金在铜基体上的电沉积。室温下所制备得Tb-Fe合金薄膜表面光滑致密,银色且具有金属光泽,与基体结合牢固。初步提出了Tb-Fe合金的电沉积行为:Tb(Ⅲ)难以单独阴极还原沉积,但能被Fe(Ⅱ)诱导共沉积。采用FE-SEM观察Tb-Fe合金薄膜的表面形貌,采用EDAX测定Tb-Fe合金薄膜的组成。结果表明,当Tb(Ⅲ)/Fe(Ⅱ)浓度比为3:1、电压为6.0V、脉频为1.0kHz,脉宽为30%,在离子液体电解液中所得到的Tb-Fe合金镀层中Tb的质量分数可达52.89%。

【Abstract】 Tb - Fe alloy films from a 1 - butyl - 3 - methylimidazolium tetrafluoroborate(BMImBF4) ionic liquid were investigated on copper substrates by pulsed electrodeposition at ambient temperature.In this ionic liquid,the smooth,adhesive, compact and metallic luster Tb - Fe alloy films were obtained.The electrodeposition mechanism of Tb - Fe alloy was put forward. Tb(Ⅲ) was not reduced to Tb alone,but it could be inductively codeposited with Fe(Ⅱ).The Tb - Fe deposits was observed by the scanning electron microscope(FE- SEM) and Energy dispersive X- ray analysis(EDAX),SEM image of Tb-Fe deposit showed that the Tb - Fe grains were small and dense,EDAX examined the composition of Tb - Fe alloy films obtained. The result indicated that the content of Tb in the Tb- Fe alloy film obtained was 52.89%.The technics parameters are followed:Tb(Ⅲ):Fe(Ⅱ) 3:1,the deposit potential 6.0V,the duty cycle 30%,the pulse frequency 1.0 kHz.

  • 【会议录名称】 2009年全国电子电镀及表面处理学术交流会论文集
  • 【会议名称】2009年全国电子电镀及表面处理学术交流会
  • 【会议时间】2009-11-01
  • 【会议地点】中国上海
  • 【分类号】TQ153.2
  • 【主办单位】中国电子学会生产技术学分会电镀专家委员会、上海市电子学会电子电镀专业委员会
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