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三价铬镀铬之二-硫酸盐镀铬工艺

Tri-valent Chromium Plating Part Two-A Process in Sulfate Bath

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【作者】 蒋义锋杨防祖许书楷田中群周绍民

【Author】 JIANG Yi-feng,YANG Fang-zu~*,XU Shu-kai,TIAN Zhong-qun,ZHOU Shao-min (State Key Laboratory of Physical Chemistry of the Solid Surfaces,Department of Chemistry, College of Chemistry and Chemical Engineering,Xiamen University,Xiamen 361005,China)

【机构】 厦门大学化学化工学院化学系固体表面物理化学国家重点实验室

【摘要】 开发出一种新型的硫酸盐三价铬镀铬工艺,以不锈钢片为阳极。介绍了其工艺规范,探讨了电流密度、温度、pH值、主盐浓度等因素对电流效率的影响。研究表明:该体系中,镀液温度为35~50℃,pH为3.0~4.5,电流密度为1.5~5.5A/dm~2,电镀时间在3~5 min时,即能得到光亮且结合力牢固的镀层;电流效率在30%左右;霍尔槽阴极片镀层覆盖达10 cm;分散能力达到60%左右;镀液抗杂质性能好;pH提高到6,回调后,镀液仍可以使用。

【Abstract】 A novel process of tri-valent chromium plating in sulfate bath was developed using stainless steel sheet as the anode.The bath composition and plating conditions were introduced.The effect of current density,temperature,pH and main salt concentration on the current efficiency were studied.The results showed that in this process bright and cohesive electrodeposit can be obtained at the following conditions of bath temperature 35~50℃,pH 3.0-4.5,current density 1.5~5.5 A/dm~2 and plating time 3-5 mins.Current efficiency is about 30%.The coating coverage on Hull Cell panel is up to 10 cm.Throwing power is about 60%.The process shows good ability of anti-impurities.After its pH value is adjusted first to 6 and then back to 3. 5 the eletrolyte solution still can be used.

【关键词】 镀铬三价铬硫酸盐工艺
【Key words】 chromium platingtri-valent chromiumsulfateprocess
  • 【会议录名称】 2009年全国电子电镀及表面处理学术交流会论文集
  • 【会议名称】2009年全国电子电镀及表面处理学术交流会
  • 【会议时间】2009-11-01
  • 【会议地点】中国上海
  • 【分类号】TQ153.11
  • 【主办单位】中国电子学会生产技术学分会电镀专家委员会、上海市电子学会电子电镀专业委员会
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