Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering

【作者】 张磊； 施立群； 何志江； 张斌；

【Author】 Zhang Lei Shi Li-Qun He Zhi-Jiang Zhang Bin (Applied Ion Beam Physics Laboratory,Institute of Modern Physics,Fudan University,Shanghai 200433,People’s Republic of China )

【机构】 Applied Ion Beam Physics Laboratory,Institute of Modern Physics,Fudan University；

【摘要】 <正>We report high quality Ti films grown in a novel electron cyclotron resonance (ECR) plasma-assisted magnetron sputtering(PMS) deposition system.The films are compared with films deposited by conventional direct current(DC) magnetron sputtering.Using ECR-PMS,the argon plasma bombardment energy and Ti film更多还原