【作者】 张艳萍； 常宏伟； 杜树斌；

【Author】 ZHANG Yan-ping,CHANG Hong-wei,DU Shu-bin Key Laboratory for Nuclear Data,China Institute of Atomic Energy,Beijing 102413,China

【机构】 中国原子能科学研究院核数据重点实验室；

【摘要】 由于基础研究方面的原因,Au/Si薄膜的研究吸引了很多科研工作者的兴趣,但是直到现在关于室温条件下低密度Au/Si薄膜形成的报告较少,薄膜形成机制尚不清楚。本工作利用离子溅射装置首次在室温条件下制备了低密度Au/Si薄膜(大大低于金的体密度19.3 g·cm^-3),并利用X射线反射（XRR）,平面内X射线衍射（XRD）和原子力显微镜（AFM）对其进行研究。结果表明:最低密度的Au/Si薄膜密度为6.2g·cm^-3,仅为Au体密度的33%,厚度为50 nm,是在同样条件下沉积的正常密度薄膜厚度的3.29倍,而沉积的原子个数大致相同;这种薄膜的结构为无定形多孔结构,极其不稳定,即使在自然光作用下其结构也会发生变化,其生长遵循非Volmer-Weber模式;AFM图像和XRR分析表明低密度薄膜的表面粗糙度值小,这与纳米粒子尺寸相关。更多还原

【Abstract】 The study on Au thin film deposited on Si attracts more interests,but few reports on formation of Au/Si with lower density at room temperature exist up to now and the formation mechanism is not clear.In this work,Au thin film with low density （33%to its bulk density） was firstly prepared at room temperature by using ion sputtering and was evaluated by x-ray reflectivity （XRR）,in-plane X-ray diffraction（XRD） and atomic force microscope（AFM）.It was shown that the lowest density of the gold thin film was 6.2 g ? cm^-3 which was 33%to bulk Au density,its thickness was 50 nm which was 3.29 times of the sample with the same density as bulk gold value while the number of atoms was same.The AFM and the analysis of XRR showed the surface roughness of thin film with lower density was small and was related to the size of nano-particles.The Au film with lower density was porous and non-equilibrium and easy to be broken and its growth followed non Volmer-Weber mode.更多还原