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沉积温度对直流等离子体CVD法在硬质合金表面制备金刚石薄膜的影响
Influence of temperature on diamond films deposited on WC-Co substrates by DC-PCVD
【作者】 尹龙承; 黄海亮; 何宪阳; 王丹; 彭鸿雁; 陈玉强;
【Author】 YIN Long-cheng~1,HUANG Hai-liang~1,HE Xian-yang~2,WANG Dan~1, PENG Hong-yan~1,CHEN Yu-qiang~1 (1.Department of Physics,Mudanjiang Normal College,Heilongjiang Province Key Laboratory of New Carbon-base Functional and Superhard Material,Mudanjiang 157012,China; 2.Mudanjiang Metrological Verification & Testing Institute Affiliate to Mudanjiang Bureau of Quality and Technical Supervision,Mudanjiang 157012,China)
【机构】 牡丹江师范学院新型炭基功能与超硬材料省重点实验室; 牡丹江市质量技术监督局计量检定所;
【摘要】 直流等离子体化学气相沉积(DC-PCVD)法能够降低金刚石膜的生产成本,因此是一项非常有前景的工业合成金刚石膜技术。采用直流等离子体化学气相沉积法,以CH4和H2为反应气体,在硬质合金YG6基体上沉积了金刚石薄膜。采用X射线衍射分析仪(XRD)、扫描电子显微镜(SEM)、拉曼光谱(Ra-man)对样品的生长织构、表面形貌、金刚石膜质量进行了表征。实验结果表明,随着沉积温度提高,金刚石膜晶粒尺寸增大,晶界含量减少,薄膜质量提高。金刚石膜中存在压应力,且随沉积温度提高而增大。Rock-well硬度压痕法表明840℃条件下沉积的金刚石膜与硬质合金之间的结合力良好。
【Abstract】 The DC plasma chemical vapor deposition(DC-PCVD) method was a promising technique to fabricate CVD diamond coatings in industry,where it was imperative to minimize the price of synthetic diamond.Diamond films were synthesized on a cemented carbide(YG6) substrate using the gaseous mixtures of methane and hydrogen by DC-PCVD.The grow texture,surface morphologies and qualities of as-deposited samples were characterized by X-ray diffractometer(XRD),scanning election microscopy(SEM) and Raman spectra methods respectively.The experimental results showed that with the increase of deposition temperature,the grain size of diamond film grow up,while the content of grain boundaries decreased,and the diamond phase purity was enhanced. The residual stress in the film was competitive,and also increases with deposition temperature.Rockwell indention test indicated that the diamond film synthesize at 840℃showed good adhesive with cemented carbide substrate.
- 【会议录名称】 第七届中国功能材料及其应用学术会议论文集(第4分册)
- 【会议名称】第七届中国功能材料及其应用学术会议
- 【会议时间】2010-10-15
- 【会议地点】中国湖南长沙
- 【分类号】TQ164
- 【主办单位】中国仪器仪表学会仪表材料分会、重庆仪表材料研究所、中南大学、《功能材料》期刊社