【作者】 肖娜； 杨波； 裴文利； 任玉平； 赵骧； 秦高梧；

【Author】 XIAO Na, YANG Bo, PEI Wen-li, REN Yu-ping, ZHAO Xiang, QIN Gao-wu (Key Laboratory for Anisotropy and Texture of Materials (Ministry of Education), Northeastern University, Shenyang 110004, China)

【机构】 东北大学材料各向异性与织构教育部重点实验室；

【摘要】 作为Co基合金垂直磁记录介质中广泛采用的下底层Ru薄膜的取向对控制磁性层c轴垂直薄膜生长有着重要的作用。引导层Ta对决定Ru下底层(0002)取向起到至关重要的作用,但是相对研究较少。采用磁控溅射法在corning7059基板上沉积Co77Pt23/Ru/Ta多层薄膜,考察了Ta层的溅射功率、气压和沉积厚度等工艺参数对Ru层和Co层c轴取向及Co77Pt23层磁性能的影响。X射线结果表明,数纳米厚的Ta层可以促进Ru层的(0002)取向,进而提高磁性层c轴(0002)的取向度。在功率适当、气压较低的条件下沉积Ta,获得的Ru和Co77Pt23层均形成良好的(0002)织构,多层膜Co77Pt23/Ru/Ta表现出垂直记录特征。振动样品磁强计(VSM)测试表明,薄膜垂直取向的磁滞回线矩形比随Co77Pt23(0002)峰强的增加而增大。更多还原

【Abstract】 Ru has been widely used as underlayer to induce vertical c-axis orientation of Co alloys for the Co-based recording media because of the similarity of the crystal structure between Co and Ru. The seeding layer Ta usually plays an important role in controlling the (0002) orientation of Ru layer while the investigation in this aspect is limited so far. In this study, Co77Pt23/Ru/Ta multi-layer films were deposited on corning7059 substrate by DC magnetron sputtering system. The effects of sputtering power, Arpressure and thickness of Ta layer on the c-axis orientation of Ru and Co77Pt23 as well as magnetic properties of Co77Pt23layer were investigated. X-ray diffraction indicates thin Ta films could promote the (0002) texture of Ru layer. Both Ru and Co77Pt23 have preferred (0002) texture when Ta layer is deposited at proper power and low pressure. Squareness ratio of magnetic hysteresis loops increases with the increase of the intensity of Co77Pt23 (0002) by appropriate Ta layer.更多还原