【作者】 王亮； 李杨； 张丹丹； 王春华； 沈烈；

【Author】 Wang Liang;Li Yang;Zhang Dan–dan;Wang Chun–hua;Shen Lie;Department of Materials Science and Engineering,Dalian Maritime University;

【机构】 大连海事大学材料科学与工程系；

【摘要】 在直流脉冲等离子体渗氮炉内放置一由双层圆筒组成的活性屏,双层圆筒与阴极相接,由于其直径不同可以产生空心阴极放电。将45钢试样放置在活性屏内,一组试样处于悬浮状态,另一组试样施加负偏压(-50~-150V),同时在400~550℃下进行离子渗氮处理。并用金相显微镜、XRD和显微硬度计对渗氮层进行对比分析。结果表明:偏压显著影响渗氮层的组织结构和性能。偏压试样渗氮层与悬浮试样相比,具有更厚的化合物层,表面硬度更高,扩散层更厚。更多还原

【Abstract】 A series of experiments have been conducted on AISI 1045 steel using a hollow cathode discharge-assisted plasma nitriding apparatus with the aim of elucidating the role of substrate bias voltages in plasma nitriding process.Treatments were carried out in NH3 atmosphere of 100 Pa for 4 h at temperatures ranging from 400 to 550 oC.The samples were characterized by optical microscopy,X-ray diffraction and microhardness measurement.The effects of voltage bias on the phase formation,microstructure and hardness of the samples were also studied by setting the voltage to 0,-50,-100 and-150 V.The results showed that the microstructure and phase constituents of the nitride layers were strongly influenced by the bias voltages.It can be seen that there is higher hardness with a thicker nitrided layer on the biased sample.更多还原