【作者】 于翔； 马磊； 王成彪； 杨敬强；

【Author】 YU Xiang;MA Lei;WANG Cheng-biao;YANG Jing-qiang;School of Engineering and Technology,China University of Geosciences;

【机构】 中国地质大学工程技术学院；

【摘要】 利用磁过滤阴极真空弧系统在单晶硅片上沉积了并比较了六种铬间隔层厚度不同的四面体非晶碳膜。用纳米压痕、纳米划痕和激光拉曼法分别检测了所制备薄膜的纳米硬度、结合力和价键结构,分析了铬间隔层厚度与薄膜力学性能之间的关系,发现铬间隔层厚度为200 nm的薄膜具有最佳的力学性能。更多还原

【Abstract】 Six tetrahedral amorphous carbon(ta-C) films with different chromium buffer layer thickness were deposited and compared on silicon wafers by using a filtered cathodic vacuum arc(FCVA) deposition system.Nano-indenter,nano-scratch tester and laser Raman spectrometer were respectively used to investigate the nano-hardness,adhesion and valence bond structure of the deposited films.Relationship between the chromium buffer layer thickness and the mechanical properties of the films is analyzed,and the ta-C film with a 200-nm thick chromium buffer layer is found to exhibit the optimal mechanical properties.更多还原